Backgrind is a process that
thins a wafer from its nominal thickness for smaller packaging requirements, by grinding away wafer material
on the backside. The wafers need to have a minimum
thickness to prevent breakage without being too thick
for packaging.
Problem
1. Roughness control for backgrind is important to
insure quality control for follow on process. A wafer
that is too smooth or too rough will be considered out
of control.
2. Stylus based
profilers have several limitations for the measurement
of backgrind wafer surfaces. The stylus tip contacts the
surface resulting either in particle contamination or
damage to the surface. The operation for the instrument
dragging a stylus tip over the surface is too slow.
Also, the stylus tip radius is often larger than the
narrow valleys of a backgrind surface, leading to a
smoothing of the overall surface roughness result.

Solution
-
Non-Contact
Profiling system ensures a non-destructive method of taking
surface measurements. With Chapman's optical scanning profilers,
there is no contact and therefore no damage to the surface.
-
Fast measurements
without the need to drag a stylus across the surface - fine
focused optical beam is used to probe the narrow valleys, giving
better representation of the true backgrind surface.
-
A wide variety of
quick and accurate measurements can be taken for process
control.
-
Circumferential
Scans - 360° around the wafer at any radius for roughness and
waviness.
-
Beam auto-focus
guarantees correct results even on the thinnest of wafers.
-
Die Crack/Edge Chip
Inspection by threshold analysis.